Public facility record
- Project state
- R&D / pilot
- Location
- Leuven, Belgium
- Location precision
- campus
- Role
- Semiconductor R&D and pilot infrastructure
- Site functions
- Semiconductor R&D · Pilot line
- Products
- Not disclosed in selected source
- Processes
- Not disclosed in selected source
- Wafer sizes
- 300 mm
- Public Scale
- 300 mm research program publicly described
- Production
- Research infrastructure; not a commercial fab-capacity claim
- Work
- Nanoelectronics research and pilot-line development
Public equipment disclosures
reported exact
1 reportedTWINSCAN EXE:5200
ASML · Installed in the Leuven pilot line in March 2026
This count covers the specifically announced High-NA tool, not every lithography system at imec.
imec advanced patterning infrastructure ↗Public relationships
imec → ASML
Joint High-NA EUV lab and pilot-line program
imec advanced patterning infrastructure ↗Production, capacity, employment, exact coordinates and equipment totals are not inferred. Undisclosed values remain undisclosed.