Public facility record
- Project state
- Unknown
- Location
- Hillsboro, Oregon, United States
- Location precision
- city-level
- Role
- Technology development and wafer fabrication
- Site functions
- R&D · Wafer fabrication
- Products
- Not disclosed in selected source
- Processes
- Not disclosed in selected source
- Wafer sizes
- Not disclosed in selected source
- Public Scale
- Facility-level capacity is not disclosed in the selected source
- Production
- Intel lists the location by manufacturing role
- Work
- Semiconductor manufacturing network
Public equipment disclosures
reported exact
1 reportedTWINSCAN EXE:5000
ASML · Installed; calibration began in 2024
First commercial High-NA system; this is not a count of all EUV tools on campus.
Intel High-NA EUV press kit ↗Public relationships
Intel D1X → ASML
One announced TWINSCAN EXE:5000 High-NA EUV system at D1X
Intel High-NA EUV press kit ↗Production, capacity, employment, exact coordinates and equipment totals are not inferred. Undisclosed values remain undisclosed.