Public facility record
- Project state
- Operating
- Location
- Hiroshima, Japan
- Location precision
- city-level
- Role
- Manufacturing location
- Site functions
- Wafer fabrication · R&D
- Products
- DRAM
- Processes
- 1-beta DRAM · 1-gamma DRAM / EUV ramp
- Wafer sizes
- Not disclosed in selected source
- Public Scale
- Site capacity not disclosed in selected source
- Production
- Listed manufacturing location
- Work
- Memory semiconductor manufacturing
Public equipment disclosures
use confirmed count undisclosed
Count undisclosedEUV lithography capability
Not named in the selected Micron source · Micron announced EUV production introduction for 1-gamma DRAM
The public announcement does not disclose a facility-level tool count.
Micron Hiroshima EUV announcement ↗Production, capacity, employment, exact coordinates and equipment totals are not inferred. Undisclosed values remain undisclosed.